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		<title>Line on Infrared Heating Lamp Sets</title>
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				<title>Wafer fabrication line equipment</title>
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				<pubDate>Sun, 07 Jun 2026 03:38:59 +0800</pubDate>
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				<description>&lt;p&gt;&lt;img src=&#34;http://ir-heat-sets.com/images/c4487c91a5d0bd93963bf8b3a19ba704.png&#34; alt=&#34;Wafer fabrication line equipment&#34;&gt;&lt;/p&gt;&#xA;&lt;p&gt;On the fab floor, a photoresist bake isn&amp;rsquo;t just a temperature step. It&amp;rsquo;s a tolerance.&#xA;A 2°C excursion will shift critical dimension bias, and a handful of particles will kill a lot of good die. You need thermal control that behaves like a real process parameter, not an afterthought bolted onto the tool.&lt;/p&gt;&#xA;&lt;h2 id=&#34;what-matters-under-the-hood&#34;&gt;What matters under the hood&lt;/h2&gt;&#xA;&lt;p&gt;We build wafer-level thermal systems around repeatable uniformity and clean execution. Halogen and NIR heating architectures keep tight control across the wafer plane, holding ±0.1°C across the film during soft bake and hard bake.&#xA;Quartz components and carbon-fiber-reinforced assemblies cut down on outgassing and keep the hot-zone geometry stable. That translates to consistent activation of the photoresist chemistry—predictable edge bead control, a stable glass transition, and repeatable etch selectivity.&#xA;Control loops are tuned for fast settling with minimal overshoot, so you don&amp;rsquo;t burn up thermal budget across the lot.&lt;/p&gt;</description>
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