DNS (Screen) wafer dryer lamp

Sat, 27 Jun 2026 04:35:31 +0800

On the line, photoresist doesn’t forgive drift. A soft bake that’s even a little off throws CD control out of whack and you end up hunting defects across the whole lot. We built the DNS screen wafer dryer lamp to take the variability out of that thermal step. What matters under the hood You get ±0.1°C temperature uniformity across the wafer plane, so every exposure field sees the same thermal budget. Cleanroom compatibility isn’t a tagline—Class 1–100 spaces stay inside particle budget because the assembly doesn’t cough up a burst of particles during ramp and soak. Short-wave infrared heats the substrate directly, so warm-up is fast and idle energy drops. The quartz-encapsulated emitter holds steady at the bake profiles you run for photoresist processing, and the control loop keeps setpoints repeatable shift after shift. Why it sticks in lithography In lithography support, the dryer lamp keeps the bake window tight, which cuts down line-width excursions and rework. Ramp to setpoint is quicker without hurting photoresist adhesion, and the clean thermal profile keeps yield intact through high-volume lots. The payoff is predictable performance: fewer scrap wafers, lower scrap cost, and consistent machine-to-machine matching across the fab. Field notes for install and upkeep Installation comes down to matching the tool interface and confirming exhaust routing so the lamp zone stays at negative pressure. The lamp is built for 24/7 duty, but like any precision thermal source, it behaves best when the power bus and cooling are sized to the duty cycle. Plan on scheduled lamp replacements to keep uniformity inside spec over the long haul.

DNS on Infrared Heating Lamp Sets

DNS (Screen) wafer dryer lamp